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Home > Mathematics and Science Textbooks > Chemistry > Crystallography > Thin Films and Epitaxy: Volume 3A-3B A. Basic Techniques(Volume 3A-3B Handbook of Crystal Growth)
Thin Films and Epitaxy: Volume 3A-3B A. Basic Techniques(Volume 3A-3B Handbook of Crystal Growth)

Thin Films and Epitaxy: Volume 3A-3B A. Basic Techniques(Volume 3A-3B Handbook of Crystal Growth)


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About the Book

This work of reference, comprising over 50 is being published in three volumes. The objective is to present the underlying scientific foundation of the multi-disciplinary field of crystal growth. The handbook is a comprehensive compendium on crystal documenting authoritatively in one publication the fundamentals of the subject. As such, it is a work which should find its way into the libraries of industrial companies engaged in crystal growth and/or epitaxy and of academic or industrial research laboratories studying crystal growth processes in whatever materials. It should also serve as a source book for graduate and post-graduate teaching in the field. Volume 3 Thin Films and Epitaxy is divided into 2 parts. Part A reviews the basic techniques of halide, organometallic and molecular beam epitaxy, liquid and solid-phase epitaxial techniques, rapid solidification by pulsed laser annealing and laser ablation of oxide thin films. The final chapter is devoted to the growth of diamond films. Part B covers the underlying mechanisms and dynamics of epitaxial growth processes including nucleation, structural, kinetic and transport effects. In addition, refinements of some of the growth techniques described in part A such as atomic layer, migratio-enhanced and photo-assisted epitaxial processes are also described.

Table of Contents:
Part A. Basic Techniques 1. Halogen transport epitaxy (H. Watanabe). 2. Levitation epitaxy (H.M. Cox). 3. The principles and practice of organometallic vapor phase epitaxy (D.W. Kisker, T.F. Kuech). 4. Principles of molecular beam epitaxy (C.T. Foxon). 5. Molecular beam epitaxy with gaseous source (H. Hirayama, H. Asahi). 6. Liquid phase epitaxy (M.B. Small, E.A. Giess, R. Ghez). 7. Solid phase epitaxy (G.L. Olson, J.A. Roth). 8. Rapid solidification of silicon and some silicides by pulsed laser annealing (P. Baeri, S.U. Campisano). 9. Pulsed laser ablation-deposition of multicomponent oxide thin films: basic laser ablation and deposition processes and influence on film characteristics (O. Auciello). 10. Growth of diamond films from the vapour phase (B.V. Spitsyn).Part B. Growth Mechanisms and Dynamics 11. Kinetic processes in vapour growth (A.A. Chernov). 12. Organometallic vapor phase epitaxy reaction kinetics (G.B. Stringfellow). 13. Transport phenomena in vapor phase epitaxy reactors (K.F. Jensen). 14. Atomic layer epitaxy (T. Suntola). 15. Nucleation and surface diffusion in molecular beam epitaxy (T. Nishinaga). 16. Migration-enhanced epitaxy (Y. Horikoshi). 17. Metalorganic vapour phase epitaxial growth of ultra-thin quantum wells and heterostructures (L. Samuelson, W. Seifert). 18. Photoassisted epitaxy (S.J.C. Irvine). 19. In situ optical studies of epitaxial growth (C. Pickering). 20. Atomic mechanisms in semiconductor liquid phase epitaxy (E. Bauser). 21. Artificial epitaxy (graphoepitaxy) (E.I. Givargizov). 22. Structural effects in coherent epitaxial semiconductor films (A. Zunger).


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Product Details
  • ISBN-13: 9780444815569
  • Publisher: Elsevier Science & Technology
  • Publisher Imprint: North-Holland
  • Language: English
  • Sub Title: Volume 3A-3B A. Basic Techniques
  • ISBN-10: 0444815562
  • Publisher Date: 23 Dec 1994
  • Binding: Hardback
  • Series Title: Volume 3A-3B Handbook of Crystal Growth
  • Weight: 1260 gr


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