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P J Timans

P J Timans

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Advanced Gate Stack, Source/Drain and Channel Engineering for Si-Based CMOS 3; New Materials, Processes and Equipment; Proceedings
Advanced Gate Stack, Source/Drain and Channel Engineering for Si-Based CMOS 3; New Materials, Processes and Equipment; Proceedings
By: P J Timans
Publisher: Electrochemical Society
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AED478
Binding:
Paperback
Release:
01 Jan 2008
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