Advances in Electrochemical Science and Engineering: v. 3

The five chapters of this volume treat topics of current significance, demonstrating how essential electrochemisty is for technological progress. W.P. Gomes and H.H. Goosens analyze the kinetics of the electrochemical reactions used for etching gallium arsenide. The authors describe means by which information about the mechanisms may be obtained. Based on the understanding of the anodic dissolution of n-type and p-type GaAs, both in the dark and under illusmination, etching mechanisms for different oxydants with and without current are derived. H.Lehmkuhl, K. Mehler and U. Landau provide a summary of the criteria and problems associated with the electrodeposition of aluminium at ambient temperature. Special emphasis is given to the organo-aluminium electrolyte developed in the laboratory of Karl Ziegler, winner of the Nobel prize in 1963. Although difficult to handdle, these electrolytes offer sume unique advantages for the deposition of aluminium. Effects that cause non-uniformity in patterned electrodeposition of microscopic features are the subject of J.O. Dukovic's chapter. Mathematical models are used to identify process conditions which lead to flat profiled features of uniform height needed in electronic components. The emergence of computer-aided-design tools for electrochemical microfabrication is discussed. Y. Okinaka and T. Osaka descrive the fundamental aspects and technological applications of autocatalytic metal deposition processes. In view of that "electroless deposition" has found important applicaitons in the manufaccture of microelectronic devices, a review of the pertaining electochemical fundamentals should be useful. Following a concise revie of direct access storage devices, a treatise on the properties and electrochemistry of magnetically soft materials is provided by P.C. Andricacos and L.T. Pomankiw. The chapter is focused on the fundamentals of the magnetics and electrochemistry of Permalloy, a material which has similar importance in magnetic storage as has silicon in semiconductor devices.

Table of Contents:
Electrochemical processed and etching of III-V compound semiconductors, W.P. Gomes and H.H. Goosens; electroless deposition processes - fundamentals and applications, Y. Okinaka and T. Osaka; current distribution and shape change in electrodeposition of thin films for microelectronic fabrication, J.O. Dukovic; the principles and techniques of electrolytic aluminium deposistion and dissolution in organoaluminium electrolytes, H. Lehkuhl, K. Mehler and U. Landau; magnetically soft materials - their properties and electrochemistry, P.C. Andriacacos and L.T. Romankiw.