Handbook of Thin Film Process Technology
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Handbook of Thin Film Process Technology

Handbook of Thin Film Process Technology


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About the Book

The Handbook of Thin Film Process Technology is a practical handbook for the thin film scientist, engineer and technician. It covers all the most important thin film deposition techniques, as well as important aspects of film processing and the major diagnostic techniques for in-process monitoring. A unique feature of the Handbook is its presentation of recipe-type information (i.e., important deposition system details and process parameters) for a range of common materials and processes. To allow the Handbook to remain the most up-to-date reference resource in its field, it is packaged in a loose-leaf binder, with additional material published regularly. The purchase price of the print edition includes four supplements from 1996 and 1997 (Thermal Spraying, Surface Modification in Vacuum, Miscellaneous Updates, Superlattices and Multilayered Systems). The 1998 and later supplements can be ordered separately.

Table of Contents:
A. Physical Deposition Techniques: A1: Thermal Evaporation (Coordinating Editors: E B Graper and J Vossen) A1.0. Introduction and general discussion (E B Graper) A1.1. Resistance evaporation (E B Graper) A1.2. Electron beam evaporation (E B Graper) A1.3. Ion vapour evaporation (E B Graper) A1.4. Cathodic arc deposition (P J Martin) A1.5. Laser ablation (A Morimoto and T Shimizu) A2: Molecular Beam Epitaxy (Coordinating Editors: S A Barnett and J Poate) A2.0. Introduction and general discussion (S A Barnett and I T Ferguson) A2.1. Semiconductor growth by metalorganic molecular beam epitaxy (MOMBE) (C R Abernathy) A2.2. Gas-source MBE (G Y Robinson) A2.3. Chemical beam epitaxy (T H Chiu) A2.4. Thin film deposition and dopant incorporation by energetic particle sources (S Strite and H Morkoc) A3: Sputtering (Coordinating Editors: S I Shah and D Glocker) A3.0. Introduction and general discussion (S I Shah) A3.1. Glow discharge sputtering (A S Penfold) A3.2. Magneton sputtering (A S Penfold) A3.3. Ion-beam sputtering (T Itoh) A3.4. Primary ion beam deposition (K Miyake) A4: Thermal Spray Coatings (Coordinating Editor: R C Tucker Jr) A4.0. Introduction to thermal spray coatings (R C Tucker Jr) A4.1. Flame spray (P A Kammer) A4.2. Plasma spray coatings (R C Tucker Jr) A4.3. High velocity oxy-fuel coatings (R C Tucker Jr) A4.4. Detonation gun deposition (R C Tucker Jr) A4.5. Mechanical, wear, corrosion and other properties of thermal spray coatings (R C Tucker Jr) B. Chemical Deposition Techniques: B1: Chemical Vapour Deposition (Coordinating Editor: L Vescan) B1.0. Introduction and general discussion (L Vescan) B1.1. Metalorganic chemical vapour deposition (MOCVD) (R D Dupuis) B1.2. Plasma-enhanced chemical vapour deposition (F Jansen) B1.3. Photoassisted chemical vapour deposition (S J C Irvine) B1.4. Thermally activated chemical vapour deposition (L Vescan) B1.5. Atomic layer epitaxy (T Suntola) C. Processing Technologies C1: Pattern transfer (Coordinating Editor: J W Coburn C1.0. Introduction and general discussion (J W Coburn) C1.1. Reactive ion etching (C Steinbruchel) C1.2. Ion-beam-based chemical dry etching (C Steinbruchel) C1.3. Ion milling (C Steinbruchel) D. Real-Time Diagnostics D0: Introduction and General Discussion (Coordinating Editor: R W Collins) D1: Diagnostic techniques D1.0. Reflection high-energy electron diffraction as a diagnostic technique (B A Joyce) D1.1. Low-energy electron diffraction (Sheng-Liang Chang and P A Thiel) D1.2. Reflection mass spectroscopy (R Kaspi) D2: Optical Diagnostics D2.0. Infra-red emission interferometry (A J Springthorpe) D2.1. Reflectance anisotropy (B Drevillon) D2.2. Interferometry as an in situ probe during processing of semiconductor wafers (V M Donnelly) D2.3. Ellipsometry (P Snyder) D2.4. Photoluminescence (P R Berger) D2.5. Elastic laser light scattering (B Gallois) D2.6. Infrared diode laser absorption spectroscopy as a plasma chemical diagnostic (R C Woods) D3: Plasma Probes D3.0. Langmuir probe diagnostics (N Hershkowitz) D3.1. Microwave interferometers (R A Breun) D3.3. Atomic absorption spectroscopy (Chih-shun Lu) D4: Other Diagnostics (Coordinating Editor: R Collins) D4.0. Quartz monitors and microbalances (J Krim and C Daly) D4.1. Probes of film stress (D Glocker) E. Surface Modification in Vacuum E1: Processes for Substrate cleaning: D Mattox E2: Surface treatment for corrosion and wear protection E2.1. Material aspects of corrosion protection (Cathy Cotell) E2.2. Ion implantation with beams (Mike Nastasi) E2.3. Plasma source ion implantation (Donald Rej) E3: Surface treatment of polymers for adhesion E3.0. Plasma sources for polymer surface treatment (M R Wertheimer and Edward Liston) E3.1. Surface chemistry of treated polymers (Lou Gerenser) F. Superlattices and Multilayered Systems F1. Growth phenomenon in superlattices (D Jesson) F2. Mechanical behaviour in artificially multilayered thin films (R C Cammarata) F4. Magnetic superlattices (E Fullerton) F5. Multilayered structures for X-ray mirrors (E Spiller) F6. Superlattices for optoelectronic applications F6.1. Si-based superlattices: F6.1.1 Photonic applications (F Y Huang and B Jalai) F6.1.2 Compund and alloy semiconductor superlattices (L Salamance-Riba) X. Materials X1: Introduction: O Knotek and A Schrey X1.1. TiN X1.2. TiAIN X1.3. TiAIVN X1.4. CrN X1.5. ZrN X1.6. HfN X1.7. BN X1.8. Diamond X1.9. Ni-Cr-B-Si X1.10. Al-bronze X1.11. Al2O3-TiO2 X2: Electronic Materials X2.0. Introduction: K Cadien and S Sivaram X2.1. GaAs X2.2. a-Si:H X2.3. AlGaAs X2.4. Tellurides X2.5. CuInSe2 X2.6. Si X2.7. Ge X2.8. Si-Ge X2.9. W X2.10. GaN X2.11. AIN X2.12. ErAs X2.13. Quaternaries X2.14. Silicides X2.15. SiSnC X2.16. SiN X3: Optical Materials X3.0. Introduction: J Targove X3.1. AIN X3.2. ZnO X3.3. PbTiO3 X3.4. KNbO3 X3.5. TiO2 X3.6. In2O3:Sn X4: Ferroelectric Materials X4.0. Introduction: M Sayer X4.1. Bi4Ti3O12 X4.2.LiNbO3 and LiTaO3 X4.3. PbTiO3/PbZrTiO3 X5: Ferromagnetic Materials X5.0. Introduction: E M T Velu and D N Lambeth X5.1. CoCr X5.2. TbFeCo X5.3. CoPt/CoPd X5.4. GdTbFe X6: Superconducting Materials X6.0. Introduction: J Azoulay X6.1. NbN X6.2. YBa2Cu3O7 X6.3. Thallium-based compounds X6.4. Mercury-based compounds X7: Miscellaneous Materials X7.1. PTFE X7.2. PPN X7.3. Ir/Pt Appendix A: List of Contributors Subject Index


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Product Details
  • ISBN-13: 9781482268959
  • Publisher: Taylor & Francis Ltd
  • Publisher Imprint: CRC Press
  • Language: English
  • Returnable: N
  • ISBN-10: 1482268957
  • Publisher Date: 01 Jan 1995
  • Binding: Digital (delivered electronically)
  • Returnable: N


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