Buy Fiber Based Interference Lithography for Large-Area Nanopatterning
Book 1
Book 2
Book 3
Book 1
Book 2
Book 3
Book 1
Book 2
Book 3
Book 1
Book 2
Book 3
Home > Science, Technology & Agriculture > Mechanical engineering and materials > Mechanical engineering > Fiber Based Interference Lithography for Large-Area Nanopatterning
Fiber Based Interference Lithography for Large-Area Nanopatterning

Fiber Based Interference Lithography for Large-Area Nanopatterning


     0     
5
4
3
2
1



Out of Stock


Notify me when this book is in stock
X
About the Book

This dissertation, "Fiber Based Interference Lithography for Large-area Nanopatterning" by Tuo, Qu, 屈拓, was obtained from The University of Hong Kong (Pokfulam, Hong Kong) and is being sold pursuant to Creative Commons: Attribution 3.0 Hong Kong License. The content of this dissertation has not been altered in any way. We have altered the formatting in order to facilitate the ease of printing and reading of the dissertation. All rights not granted by the above license are retained by the author. Abstract: The research work during my MPhil study, a fiber optic interference lithography system, is concluded and presented in this thesis. The first part of this thesis introduces the establishment of this system, which is named All-Fiber Interference Lithography (AFIL) due to its main novelty and advantages. These features benefit from fiber-optic components, instead of discrete optical components which tend to be bulky, expensive and vulnerable. As a result, the flexibility and usability of the two-beam laser interference lithography (LIL) could be greatly enhanced. A novel interference fringe stabilization technique that directly moves a piezoelectric actuated stage carrying one of the two fiber ends to compensate the relative phase shifts between two laser beams, was also realized by the hard ware circuits and software programming, so as to enable stable and long-time exposure. The second part of this thesis presents the systematic fabrication results. Two 2-inch diameter photoresist samples were fabricated with and without relative light phase stabilization. In addition to the atomic force microscopy (AFM) characterizations at different spots on the two samples, the relative phase shifts during the exposure and the light intensity distribution profiles were considered together to simulate the contrast of the patterns at different spots. Moreover, grating and complex periodic nanostructures with pitches as small as 240 nm were fabricated in photoresist coated on silicon and glass substrates with size up to 4-inch diameter. Challenges and operation procedures to obtain high-quality nanopatterns using AFIL are also emphasized in this part. The last part of this thesis briefly demonstrates a number of applications. The molds of novel three-level surface enhanced Raman spectroscopy (SERS) substrates were fabricated by double AFIL exposure, and followed by silver evaporation and ultraviolet nanoimprint lithography (UV-NIL) pattern transfer. The SERS signal and enhancement performance were evaluated. The AFIL photoresist nanopatterns on indium tin oxide (ITO) glass substrates could act as masks to electroplate nanostructured nickel for making high-temperature thermal nanoimprint molds. Besides, the soft lithography mold was fabricated through transferring the photoresist nanopatterns to Polydimethylsiloxane (PDMS). Subjects: Photolithography


Best Sellers


Product Details
  • ISBN-13: 9781361013854
  • Publisher: Open Dissertation Press
  • Publisher Imprint: Open Dissertation Press
  • Height: 279 mm
  • No of Pages: 114
  • Weight: 281 gr
  • ISBN-10: 1361013850
  • Publisher Date: 26 Jan 2017
  • Binding: Paperback
  • Language: English
  • Spine Width: 6 mm
  • Width: 216 mm


Similar Products

Add Photo
Add Photo

Customer Reviews

REVIEWS      0     
Click Here To Be The First to Review this Product
Fiber Based Interference Lithography for Large-Area Nanopatterning
Open Dissertation Press -
Fiber Based Interference Lithography for Large-Area Nanopatterning
Writing guidlines
We want to publish your review, so please:
  • keep your review on the product. Review's that defame author's character will be rejected.
  • Keep your review focused on the product.
  • Avoid writing about customer service. contact us instead if you have issue requiring immediate attention.
  • Refrain from mentioning competitors or the specific price you paid for the product.
  • Do not include any personally identifiable information, such as full names.

Fiber Based Interference Lithography for Large-Area Nanopatterning

Required fields are marked with *

Review Title*
Review
    Add Photo Add up to 6 photos
    Would you recommend this product to a friend?
    Tag this Book Read more
    Does your review contain spoilers?
    What type of reader best describes you?
    I agree to the terms & conditions
    You may receive emails regarding this submission. Any emails will include the ability to opt-out of future communications.

    CUSTOMER RATINGS AND REVIEWS AND QUESTIONS AND ANSWERS TERMS OF USE

    These Terms of Use govern your conduct associated with the Customer Ratings and Reviews and/or Questions and Answers service offered by Bookswagon (the "CRR Service").


    By submitting any content to Bookswagon, you guarantee that:
    • You are the sole author and owner of the intellectual property rights in the content;
    • All "moral rights" that you may have in such content have been voluntarily waived by you;
    • All content that you post is accurate;
    • You are at least 13 years old;
    • Use of the content you supply does not violate these Terms of Use and will not cause injury to any person or entity.
    You further agree that you may not submit any content:
    • That is known by you to be false, inaccurate or misleading;
    • That infringes any third party's copyright, patent, trademark, trade secret or other proprietary rights or rights of publicity or privacy;
    • That violates any law, statute, ordinance or regulation (including, but not limited to, those governing, consumer protection, unfair competition, anti-discrimination or false advertising);
    • That is, or may reasonably be considered to be, defamatory, libelous, hateful, racially or religiously biased or offensive, unlawfully threatening or unlawfully harassing to any individual, partnership or corporation;
    • For which you were compensated or granted any consideration by any unapproved third party;
    • That includes any information that references other websites, addresses, email addresses, contact information or phone numbers;
    • That contains any computer viruses, worms or other potentially damaging computer programs or files.
    You agree to indemnify and hold Bookswagon (and its officers, directors, agents, subsidiaries, joint ventures, employees and third-party service providers, including but not limited to Bazaarvoice, Inc.), harmless from all claims, demands, and damages (actual and consequential) of every kind and nature, known and unknown including reasonable attorneys' fees, arising out of a breach of your representations and warranties set forth above, or your violation of any law or the rights of a third party.


    For any content that you submit, you grant Bookswagon a perpetual, irrevocable, royalty-free, transferable right and license to use, copy, modify, delete in its entirety, adapt, publish, translate, create derivative works from and/or sell, transfer, and/or distribute such content and/or incorporate such content into any form, medium or technology throughout the world without compensation to you. Additionally,  Bookswagon may transfer or share any personal information that you submit with its third-party service providers, including but not limited to Bazaarvoice, Inc. in accordance with  Privacy Policy


    All content that you submit may be used at Bookswagon's sole discretion. Bookswagon reserves the right to change, condense, withhold publication, remove or delete any content on Bookswagon's website that Bookswagon deems, in its sole discretion, to violate the content guidelines or any other provision of these Terms of Use.  Bookswagon does not guarantee that you will have any recourse through Bookswagon to edit or delete any content you have submitted. Ratings and written comments are generally posted within two to four business days. However, Bookswagon reserves the right to remove or to refuse to post any submission to the extent authorized by law. You acknowledge that you, not Bookswagon, are responsible for the contents of your submission. None of the content that you submit shall be subject to any obligation of confidence on the part of Bookswagon, its agents, subsidiaries, affiliates, partners or third party service providers (including but not limited to Bazaarvoice, Inc.)and their respective directors, officers and employees.

    Accept

    Fresh on the Shelf


    Inspired by your browsing history


    Your review has been submitted!

    You've already reviewed this product!