More than two decades have passed since the first edition of Plasma Electronics was published. Today, we are entering an era that demands increasingly sophisticated control and design of plasma sources and related surface technologies for micro- and nano-electronic device fabrication. Plasma technology, based on surface interactions, continues to expand into emerging fields including biotechnology, medical science, and environmental applications.
Plasma Electronics: Applications in Microelectronic Device Fabrication, Third Edition, explains the fundamental physics and numerical methods essential for advancing these technologies from laboratory research to manufacturing-scale modeling and design of plasma sources and processes. This comprehensive resource has established itself as the standard reference for scientists, engineers, and graduate students working with weakly ionized, non-equilibrium plasmas. The book begins with a brief history of elementary processes and collective properties in low-temperature plasma, providing readers with essential context for understanding current developments and future prospects. Beyond traditional plasma knowledge, the content is systematically organized to enable quantitative understanding of surface-reactive plasmas through collision physics in gases and on surfaces, stochastic Boltzmann equation applications, electron and ion kinetics fundamentals, computational physics methodologies and plasma source design and optimization. The text addresses practical challenges head-on, including predictive modeling of spatiotemporally changing surfaces in contact with plasma through advanced numerical methods and control strategies. This approach ensures readers can apply theoretical knowledge to real-world manufacturing scenarios. Applications of negative charges generated in a low-temperature plasma will open up the world with innovative technologies. In this third edition, macroscopic functions of negative charges are added and elucidated for representative examples, including negative charge injection into a micro-structured surface on the electrode and the sustainability of active bulk plasma.
This book remains a unique and indispensable resource for researchers and engineers seeking to master radiofrequency collisional plasmas and their structure, function, and applications in today's rapidly evolving technological landscape.
Key Features:
· Provides essential fundamental physics and advanced numerical methods that enable researchers to transition plasma technologies from laboratory to factory
· Provides systematic coverage of surface-reactive plasma physics
· Addresses expanding plasma technology applications across biotechnology, medical science, and environmental fields
Table of Contents:
CHAPTER 1, Introduction CHAPTER 2, Historical progress related to Plasma Electronics CHAPTER 3, Phenomenological Description of the Charged Particle Transport CHAPTER 4, Macroscopic Plasma Characteristics CHAPTER 5, Elementary Processes in Gas Phase and on Surfaces CHAPTER 6 The Boltzmann Equation and Transport Equations of Charged Particles CHAPTER 7, General Properties of Charged Particle Transport in Gases CHAPTER 8, Modeling of Nonequilibrium (Low-Temperature) Plasmas CHAPTER 9, Numerical Procedure of Modeling CHAPTER 10 Capacitively Coupled Plasma CHAPTER 11 Inductively Coupled Plasma CHAPTER 12 Magnetically Enhanced Plasma CHAPTER 13 Plasma Processing and Related Topics CHAPTER 14 Atmospheric-Pressure, Low-Temperature Plasma CHAPTER 15 Reactive Electronegative Plasmas for Surface Processes. References. Index.
About the Author :
Toshiaki Makabe received his BSc, MSc, and Ph.D. degrees in electrical engineering all from Keio University. He became a Professor of Electronics and Electrical Engineering in the Faculty of Science and Technology at Keio University in 1991.
Zoran Lj. Petrović obtained his Master's degree in the Department of Applied Physics, Faculty of Electrical Engineering at the University of Belgrade, and earned his Ph.D. from the Australian National University.
