Reaction Diffusion and Solid State Chemical Kinetics: (Volumes 67-68 Materials Science Foundations)

This monograph deals with a physico-chemical approach to the problem of the solid-state growth of chemical compound layers and reaction-diffusion in binary heterogeneous systems formed by two solids; as well as a solid with a liquid or a gas. It is explained why the number of compound layers growing at the interface between the original phases is usually much lower than the number of chemical compounds in the phase diagram of a given binary system. For example, of the eight intermetallic compounds which exist in the aluminium-zirconium binary system, only ZrAl3 was found to grow as a separate layer at the Al - Zr interface under isothermal conditions. The physico-chemical approach predicts that, in most cases, the number of compound layers should not exceed two; with the main factor, resulting in the appearance of additional layers, being crack formation due to thermal expansion and volume effects. The book is addressed to research workers, engineers, post-graduates and students (physical, solid-state and inorganic chemists, metal and solid-state physicists, materials and corrosion scientists, metallurgists, etc.) who are involved in the study of solid-state processes and their practical applications. The latter include the solid-state synthesis of inorganic substances, protective coatings, corrosion, all-in-one joining of dissimilar metals, welding, soldering, brazing and thin-film electronics technology. It will also be of value to theoreticians, experimentalists and technologists.

Table of Contents:
Summary Preface Introductory Note Table of Contents 1. Formation of a Chemical Compound Layer at the Interface of Two Elementary Substances 1.1 Description of the Kinetics of Solid-State Heterogeneous Reactions 1.2 Reaction Diffusion 1.3 Growth of the Apbq Layer at the Expense of Diffusion Ofcomponent B 1.4 Growth of the ApBq Layer at the Expense of Diffusion of Components A and B 1.5 Linear Growth of the Cu6Sn5 Layer in the Copper-Tin Reaction Couple 1.6 Parabolic Growth of the AlSb Layer in the Aluminium-Antimonydiffusion Couple 1.7 Linear-Parabolic Growth of the SiO2 Layer between Silicon and Oxygen 1.8 Growth Kinetics of the NiBi3 Layer at the Nickel-Bismuth Interface 1.9 Interconnection between the Reaction- and Self-Diffusioncoefficient of the Components of a Chemical Compound 1.10 Single Compound Layer: Short Conclusions 2. Growth Kinetics of Two Compound Layers between Elementary Substances 2.1 Partial Chemical Reactions at Phase Interfaces 2.2 A System of Differential Equations Describing the Rates of Formation of Two Chemical Compound Layers 2.3 Initial Linear Growth of the ApBq andArBs Layers 2.4 Minimal Thickness of the ArBs Layer Necessary for the ApBq Layer to Occur 2.5 Non-Linear Growth of the ApBq Layer 2.6 Effect of the Critical Thickness of the ApBqLayer with Regard to Component A on the Process of Growth of the ArBsLayer 2.7 Paralinear Growth Kinetics of Two Compound Layers 2.8 Diffusion Controlled Growth of the ApBq and ArBs Layers 2.9 Nibi Layer: Missing or too Thin? 2.10 Two Compound Layers: Short Conclusions 3. Occurrence of Multiple Compound Layers at the a–b Interface 3. Occurrence of Multiple Compound Layers at the a–b interface 3.1 Chemical Reactions at Phase Interfaces in a Multiphase Binary System 3.2 A System of Differential Equations Describing the Growth Process of Three Chemical Compound Layers between Elementary Substances A and B 3.3 Initial Linear Growth of Three Compound Layers 3.4 Transition from Linear to Non-Linear Layer-Growth Kinetics 3.5 Critical Values of Compound-Layer Thicknesses and their Influence on Layer-Growth Kinetics 3.6 Diffusional Stage of Formation of Compound Layers 3.7 Sequence of Compound-Layer Formation at the A–B Interface 3.8 Formation of Intermetallic Layers in Ni–Zn and Co–Zn Diffusion Couples 3.9 Multiple Compound Layers: Short Conclusions 4. Growth Kinetics of the same Chemical Compound Layer in Various Reaction Couples of a Multiphase Binary System 4.1. Growth of the ArBs Layer in the A–B Reaction Couple 4.2 Growth of the ArBs Layer in the ApBq–B Reaction Couple 4.3 Growth of the ArBs Layer in the ApBq –AlBn Reaction Couple 4.4 Comparison of the Growth Rates of the ArBs Layer in Various Reaction Couples of the A–B Multiphase Binary System 4.5 Duplex Structure of the ArBs Layer 5. Reaction-Diffusion Kinetics in Solid-Liquid and Solid-Gas Systems 4.6 Growth of the Chemical Compound Layer in Various Reaction Couples: Short Conclusions 5.1 Main Relationships Governing Dissolution of Solids in Liquids 5.2 Experimental Investigation of the Dissolution Process of a Solid in a Liquid 5.3 Growth Kinetics of the Chemical Compound Layer under Conditions of its Simultaneous Dissolution in the Liquid Phase 5.4 Growth Kinetics of Intermetallic Layers at the Transition Metal-Liquid Aluminum Interface 5.5 Interfacial Interaction of Nickel and Cobalt with Liquid Pb-Free Soldering Alloys 5.6 Peculiarities of Kinetic Dependences in Solid-Gas Systems 5.7 Reaction-Diffusion Kinetics in Solid-Liquid and Solid-Gas Systems: Short Conclusions Concluding Remarks References Keyword Index