Practical Surface Analysis: v. 1

The growth and diversification of surface analytical techniques began in the 1960s with the development of electron spectroscopy - first Auger electron spectroscopy (AES), closely followed by X-ray photo-electron spectroscopy (XPS or ESCA). Today these two complementary techniques still dominate the surface analysis scene. Although literature reviews of aspects of AES and XPS are legion a text is needed which reflects the new maturity of these techniques in a way which is useful practically, especially for newcomers to applied surface analysis. The aim of this book is to correct this omission and to present, in one volume, all of the important concepts and tabulated data. A brief introduction gives the historical background to AES and XPS and sets them in the perspective of surface analytical techniques as a whole. The essentials of technique are covered in chapters on instrumentation, spectral interpretation, depth profiling and quantification. The remaining chapters are intended to give an insight into the major fields of application, both in terms of the special attributes of AES and XPS and the contribution they have made. These fields are microelectronics, metallurgy, catalysis, polymer technology and corrosion science. Throughout, the underlying electron spectroscopy link between AES and XPS is stressed. Aspects of technique which have fundamental importance in day-to-day operation such as instrument calibration, XPS binding energy referencing and XPS data processing (especially complex curve resolution) are discussed the appendices. Finally there are full tabulations of major peak positions in AES and XPS, relative sensitivity factors for XPS and binding energy/Auger parameter data for elements and compounds.

Table of Contents:
A perspective on the analysis of surfaces and interfaces, M.P.Seah and D.Briggs; instrumentation, J.C.Riviere; spectral interpretation, D.Briggs and J.C.Riviere; depth profiling in AES and XPS, S.Hofmann; quantification of AES and XPS, M.P.Seah; AES in metallurgy, M.P.Seah; applications of electron spectroscopy to heterogeneous catalysis, Tery L.Barr; applications of XPS in polymer technology, D.Briggs; uses of augar electron and photelectron spectroscopies in corrosion science, N.S.McIntyre and T.C.Chan. Appendices: spectrometer energy scale calibration, M.P.Seah and G.C.Smith; charge referencing techniques for insulators, M.P.Seah; data analysis in XPS and AES, P.M.A.Sherwood; auger chemical shifts and the auger parameter, S.Waddington; photoelectron and augar energies and the augar parameter - a data set, C.D.Wagner; empirically derived atomic sensitivity factors for XPS; line positions form Mg X-rays, by element; line positions from A1 X-rays, by element; line positions from Mg X-rays in numerical order; line positions from A1 X-rays, in numerical order; kinetic energies of augar electrons - experimental data from spectra acquired by X-ray excitation, C.D.Wagner.