High-k Materials in Multi-Gate FET Devices
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High-k Materials in Multi-Gate FET Devices: (Science, Technology, and Management)

High-k Materials in Multi-Gate FET Devices: (Science, Technology, and Management)

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About the Book

High-k Materials in Multi-Gate FET Devices focuses on high-k materials for advanced FET devices. It discusses emerging challenges in the engineering and applications and considers issues with associated technologies. It covers the various way of utilizing high-k dielectrics in multi-gate FETs for enhancing their performance at the device as well as circuit level. Provides basic knowledge about FET devices Presents the motivation behind multi-gate FETs, including current and future trends in transistor technologies Discusses fabrication and characterization of high-k materials Contains a comprehensive analysis of the impact of high-k dielectrics utilized in the gate-oxide and the gate-sidewall spacers on the GIDL of emerging multi-gate FET architectures Offers detailed application of high-k materials for advanced FET devices Considers future research directions This book is of value to researchers in materials science, electronics engineering, semiconductor device modeling, IT, and related disciplines studying nanodevices such as FinFET and Tunnel FET and device-circuit codesign issues.

Table of Contents:
Chapter 1 Introduction to Multi-Gate FET Devices Chapter 2 High-k Gate Dielectrics and Metal Gate Stack Technology for Advance Semiconductor Devices: An Overview Chapter 3 Influence of High-k Material in Gate Engineering and in Multi-Gate Field Effect Transistor Devices Chapter 4 Trap Charges in High-k and Stacked Dielectric Chapter 5 Impact of High-k Dielectric on the Gate-Induced Drain Leakage of Multi-Gate FETs Chapter 6 Advanced FET Design Using High-k Gate Dielectric and Characterization for Low-Power VLSI Chapter 7 Simulation and Analysis of Gate Stack DG MOSFET with Application of High-k Dielectric Using Visual TCAD Chapter 8 Novel Architecture in Gate All-Around (GAA) MOSFET with High-k Dielectric for Biomolecule Detection Chapter 9 Asymmetric Junctionless Transistor: A SRAM Performance Study Chapter 10 Performability Analysis of High-k Dielectric-Based Advanced MOSFET in Lower Technology Nodes Index


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Product Details
  • ISBN-13: 9780367639693
  • Publisher: Taylor & Francis Ltd
  • Publisher Imprint: CRC Press
  • Height: 234 mm
  • No of Pages: 164
  • Weight: 308 gr
  • ISBN-10: 0367639696
  • Publisher Date: 25 Sep 2023
  • Binding: Paperback
  • Language: English
  • Series Title: Science, Technology, and Management
  • Width: 156 mm


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