Nanofabrication Using Focused Ion and Electron Beams: Principles and Applications(Oxford Series in Nanomanufacturing)

Nanofabrication Using Focused Ion and Electron Beams presents fundamentals of the interaction of focused ion and electron beams (FIB/FEB) with surfaces, as well as numerous applications of these techniques for nanofabrication involving different materials and devices. The book begins by describing the historical evolution of FIB and FEB systems, applied first for micro- and more recently for nanofabrication and prototyping, practical solutions available in the market for different applications, and current trends in development of tools and their integration in a fast growing field of nanofabrication and nanocharacterization. Limitations of the FIB/FEB techniques, especially important when nanoscale resolution is considered, as well as possible ways to overcome the experimental difficulties in creating new nanodevices and improving resolution of processing, are outlined. Chapters include tutorials describing fundamental aspects of the interaction of beams (FIB/FEB) with surfaces, nanostructures and adsorbed molecules; electron and ion beam chemistries; basic theory, design and configuration of equipment; simulations of processes; basic solutions for nanoprototyping. Emerging technologies as processing by cluster beams are also discussed. In addition, the book considers numerous applications of these techniques (milling, etching, deposition) for nanolithography, nanofabrication and characterization, involving different nanostructured materials and devices. Its main focus is on practical details of using focused ion and electron beams with gas assistance (deposition and etching) and without gas assistance (milling/cutting) for fabrication of devices from the fields of nanoelectronics, nanophotonics, nanomagnetics, functionalized scanning probe tips, nanosensors and other types of NEMS (nanoelectromechanical systems). Special attention is given to strategies designed to overcome limitations of the techniques (e.g., due to damaging produced by energetic ions interacting with matter), particularly those involving multi-step processes and multi-layer materials. Through its thorough demonstration of fundamental concepts and its presentation of a wide range of technologies developed for specific applications, this volume is ideal for researches from many different disciplines, as well as engineers and professors in nanotechnology and nanoscience.

Table of Contents:
Introduction I-1. Historical development of electron beam induced deposition and etching: from carbon to functional materials I. Utke, H. Koops I-2. Historical evolution of FIB technology: from circuit editing to nanoprototyping Ph. Russell. Part I. Fundamentals and Models 1. The theory of bright field electron and field ion emission sources R.Forbes 2. How to select compounds for focused charged particle beam assisted etching and deposition Tristan Bret, Patrik Hoffmann 3. Gas Injection Systems for FEB and FIB Processing: Theory and Experiment Vinzenz Friedli, Heinz D. Wanzenboeck, and Ivo Utke 4. Fundamentals of interactions of electrons with molecules John H. Moore, Petra Swiderek, Stefan Matejcik, Michael Allan 5. Simulation of focused ion beam milling Heung-Bae Kim, Gerhard Hobler 6. FEB and FIB continuum models for one molecule species Ivo Utke 7. Continuum modeling of electron beam induced processes Charlene J. Lobo and Milos Toth 8. Monte Carlo method in EBID process simulations Kazutaka Mitsuishi Part II. Applications Topical Reviews 9. Focused electron beam induced processing (FEBIP) for industrial applications Thorsten Hofmann, Nicole Auth, Klaus Edinger 10. Focused Ion Beam and DualBeam(TM) technology applied to nanoprototyping O. Wilhelmi, J.J.L. Mulders 11. Review of FIB-tomography L. Holzer and M. Cantoni 12. In-situ Monitoring of Gas-Assisted Focused Ion Beam and Focused Electron Beam Induced Processing I. Utke, M. G. Jenke, V. Friedli, J. Michler 13. Cluster Beam Deposition of Metal, Insulator, and Semiconductor Nanoparticles Adam M. Zachary, Igor L. Bolotin, and Luke Hanley Sensor Prototyping 14. Electron- and ion- assisted metal deposition for the fabrication of nanodevices based on individual nanowires Francisco Hernández-Ramírez, Román Jiménez-Díaz, Juan Daniel Prades, Albert Romano-Rodríguez 15. Focused ion beam fabrication of carbon nanotube and ZnO nanodevices Guangyu Chai, Oleg Lupan, and Lee Chow 16. Focused Ion and Electron Beam induced deposition of magnetic nanostructures M.S. Gabureac, L. Bernau, I. Utke, A. Fernandez-Pacheco and J. M. DeTeresa 17. Metal films deposited by FIB and FEB for nanofabrication and nanocontacting purposes A. R. Vaz, S.A. Moshkalev Photonic Device Prototyping (chapter length about 15 pages) 18. FIB Etching for Photonic Device Applications M.J.Cryan, Y-L.D.Ho, P.S.Ivanov, P.J.Heard, J.Rorison and J.G.Rarity 19. Gas assisted FIB etching of InP for rapid-prototyping of photonic crystals Victor Callegari, Urs Sennhauser, and Heinz Jaeckel 20. Applications of FIB for rapid prototyping of photonic devices, fabrication of nano sieve, nanowire and nano antennas V.J.Gadgil 21. Focused particle beam induced deposition of silicon dioxide Heinz D. Wanzenboeck Electrical Characterization 22. Growth and characterization of FEB-deposited suspended nanostructures G. Gazzadi and S. Frabboni 23. Electrical transport properties of metallic nanowires and nanoconstrictions created with FIB J.M. De Teresa, A. Fernández-Pacheco, R. Córdoba, M.R. Ibarra 24. Structure-property relationship in electronic transport on FEBID structures Michael Huth 25. Characterization of nanostructured carbon materials using FIB A. R. Vaz, C. Veríssimo, F.P. Rouxinol, R.V. Gelamo and S. A.Moshkalev Electron Beam Lithography with new materials 26. Electron Beam Controlled Patterning of Molecular Layers: Functional Surfaces and Nanomembranes Armin Goelzhaeuser 27. Nanofabrication using Electron Beam Lithography Processes Antonio Carlos Seabra, Mariana Pojar and Simone Camargo Trippe Prospectives F-1. Focused beam processing - new beam technologies - new challenges in process development and nanofabrication J. Melngailis, S. A. Moshkalev, I. Utke

About the Author :
Ivo Utke is Vice Head of the Laboratory for Mechanics of Materials and Nanostructures at EMPA, The Swiss Federal Laboratories for Materials Testing and Research. Stanislav Moshkalev is Head of the Nanotechnology Group at the Center for Semiconductor Components, UNICAMP, Campinas, Brazil. Phillip E. Russell is Distinguished Professor of Science Education and Physics in the Department of Physics and Astronomy, Appalachian State University.

Review :
The first part of the book includes eight chapters and occupies roughly one-third of the book, whilst the second part incorporates about 20 chapters and takes up about two-thirds of the book. Such a distribution of material ensures that the basic concepts of these technologies are thoroughly explained ... In a word, one would aver that the volume contains essentially everything one would need to gain a deep understanding of the topics and probably a little more besides.