Surface Processing: Laser, Lamp, Plasma: Volume 82(Volume 82 European Materials Research Society Symposia Proceedings)

This book contains both the invited and the contributed papers presented at the Symposium "Surface Processing: Laser, Lamp, Plasma" held during the annual Spring Meeting of the European Materials Research Society in Strasbourg, France, June 16-19 1998. Surface processing of materials using laser, lamp or plasma is one of the most active fields of research in Europe and, as such, requires to be periodically reviewed at International Conference level. This year, the expanded surface processing symposium lasted for 3.5 days and, as an international forum, addressed not only fundamental questions in the field but also progress and new perspectives in various applications. The major subjects discussed during the meeting included fundamental process studies, modelling of growth mechanisms and surface modification, characterization of synthesised or modified materials, material modification at a nanometric scale, development of in-situ analytical techniques and applications towards device fabrication. About 200 papers were presented by some 120 participants.

Table of Contents:
Selected papers: Preface. Size, shape anisotropy, and distribution of Cu nanocrystals prepared by pulsed laser deposition (R. Serna et al.). Spatio-energetical characteristics of laser plasma in cross-beam pulsed laser deposition (A. Tselev et al.). Laser-induced crystallization of amorphous silicon–carbon alloys studied by Raman microspectroscopy (C. Palma et al.). Pulsed KrF laser annealing of RF sputtered ZnS:Mn thin films (E.A. Mastio et al.). On the origin of the different velocity peaks of particles sputtered from surfaces by laser pulses or charged-particle beams (A. Miotello, R. Kelly). Laser-assisted CVD of boron carbide at atmospheric pressure (J.C. Oliveira et al.). Unusual growth of pulsed laser deposited bismuth films on Si (100) (A. Dauscher et al.). Evidence for volume boiling during laser ablation of single crystalline targets (V. Craciun, D. Craciun). Characteristics of the microstructures of alumina-based refractory materials treated with CO2 and diode lasers (L. Bradley et al.). Growth of tantalum pentoxide film by pulsed laser deposition (J.-Y. Zhang et al.). Zirconium oxide films deposited by reactive pulsed laser ablation (C. Flamini et al.). UV etching accompanied by modifications. Surface etching (N. Bityurin). DUV laser-induced deposition of a-C:H from CH2I2 at room temperature (M. Lindstam et al.). Thermal behaviour of Co/Si/W/Si multilayers under high intensity excimer laser pulses (E. Majkova et al.). Laser-induced deformation on hard disk surface (D.M. Liu et al.). Study of particles ejected after pulsed laser ablation of a graphite target (B. Angleraud et al.). Deposition of SiC and AIN thin films by laser ablation (J. Meinschien et al.). Pulsed laser deposition of lithium niobate: a parametric study (D. Ghica et al.). Author index. Subject index.